Title:
特にリソグラフィのための極短紫外の光を生成するための方法及び装置
Document Type and Number:
Japanese Patent JP2004533704
Kind Code:
A
Abstract:
Method and device for generating light in the extreme ultraviolet, notably for lithography. According to the invention, a laser beam (24) is caused to interact with a dense fog (20) of microdroplets of a liquid. This liquid is a liquefied noble gas. In particular, liquid xenon (6) is used, the latter is produced by liquefying gaseous xenon (10) with which liquid xenon is pressurized to a pressure from 5x10<5 >Pa to 50x10<5 >Pa, and this liquid xenon is maintained at a temperature from -70° C. to -20° C., the pressurized liquid xenon is injected into a nozzle (4) the minimum internal diameter of which ranges from 60 mum to 600 mum, this nozzle opening into an area where pressure is equal to or less than 10<-1 >Pa.
More Like This:
Inventors:
Martin Schmid
Olivier Cheburmontier
Tiberio Secotti
Marc Segel
Olivier Cheburmontier
Tiberio Secotti
Marc Segel
Application Number:
JP2002582673A
Publication Date:
November 04, 2004
Filing Date:
April 16, 2002
Export Citation:
Assignee:
COMPAGNIE GENERALE DES MATIERES NUCLEAIRES
International Classes:
G03F7/20; H01J35/20; H01L21/027; H05G1/00; H05G2/00; (IPC1-7): H05G2/00; H01J35/20; H01L21/027
Attorney, Agent or Firm:
Masatake Shiga
Tadashi Takahashi
Takashi Watanabe
Masakazu Aoyama
Suzuki Mitsuyoshi
Kazuya Nishi
Yasuhiko Murayama
Shinya Mitsuhiro
Tadashi Takahashi
Takashi Watanabe
Masakazu Aoyama
Suzuki Mitsuyoshi
Kazuya Nishi
Yasuhiko Murayama
Shinya Mitsuhiro