Title:
選択的フォトレジストストリッピングおよびプラズマ灰化残渣洗浄のための、アンモニア不含フッ化物塩含有マイクロエレクトロニクス洗浄組成物
Document Type and Number:
Japanese Patent JP2005500408
Kind Code:
A
Abstract:
Ammonia-free, HF-free cleaning compositions for cleaning photoresist and plasma ash residues from microelectronic substrates, and particularly to such cleaning compositions useful with and having improved compatibility with microelectronic substrates characterized by sensitive porous and low-κ to high-κ dielectrics and copper metallization. The cleaning composition contain one or more non-ammonium producing, non-HF producing fluoride salt (non ammonium, quaternary ammonium fluoride salt) in a suitable solvent matrix.
Inventors:
Chen-Ping Sherman Shu
Application Number:
JP2003512358A
Publication Date:
January 06, 2005
Filing Date:
July 08, 2002
Export Citation:
Assignee:
MALLINCKRODT BAKER INC.
International Classes:
C11D3/24; C11D1/62; C11D3/00; C11D3/02; C11D3/20; C11D3/26; C11D3/28; C11D3/30; C11D3/32; C11D3/43; C11D7/10; C11D7/32; C11D7/50; C11D11/00; C23G5/036; G03F7/42; H01L21/02; H01L21/304; H01L21/311; H01L21/3213; C11D7/26; C11D7/34; (IPC1-7): C11D3/24; C11D3/26; C11D3/43; C23G5/036; H01L21/304
Attorney, Agent or Firm:
Aoyama Aoi
Mitsutaka Iwasaki
Shoji Nakajima
Kazuaki Kojima
Mitsutaka Iwasaki
Shoji Nakajima
Kazuaki Kojima