Title:
顕微鏡のひずみの影響を低減するためのデバイス
Document Type and Number:
Japanese Patent JP2005520281
Kind Code:
A
Abstract:
This invention relates to a device for reducing the impact of undesired distortions when studying a sample in an electron microscope, wherein said sample is arranged to be mounted on a micro-positioning device, characterised in that said micro-positioning device is connected with a control device, being arranged to control said micro-positioning device so as to compensate for measurement errors due to undesired distortions.
Inventors:
Olin, Hakan
Svenson, Christer
Alhoff, Fredrick
Danilov, Andre
Bentson, Paul
Hospels, martin
Svenson, Christer
Alhoff, Fredrick
Danilov, Andre
Bentson, Paul
Hospels, martin
Application Number:
JP2003513000A
Publication Date:
July 07, 2005
Filing Date:
July 12, 2002
Export Citation:
Assignee:
Nano Factory Instruments Arb
International Classes:
G01Q30/20; H01J37/20; G01Q20/00; G01Q60/00; (IPC1-7): H01J37/20
Domestic Patent References:
| JPH08273570A | 1996-10-18 | |||
| JPH08321274A | 1996-12-03 | |||
| JPH07272665A | 1995-10-20 | |||
| JPH10302697A | 1998-11-13 | |||
| JPH01316602A | 1989-12-21 |
Attorney, Agent or Firm:
Kazunori Saito