適合接触マスクめっきを用いてめっき工程を行っている際に堆積の品質を測定する方法および装置

Title:

適合接触マスクめっきを用いてめっき工程を行っている際に堆積の品質を測定する方法および装置

Document Type and Number:

Japanese Patent JP2005524775

Kind Code:

A

Abstract:

Electrochemical fabrication (e.g. EFAB) processes and apparatus are disclosed that provide monitoring of at least one electrical parameter (e.g. voltage) during selective deposition where the monitored parameter is used to help determine the quality of the deposition that was made. If the monitored parameter indicates that a problem occurred with the deposition, various remedial operations may be undertaken to allow successful formation of the structure to be completed.

Inventors:

Chang, Gengu
Cohen, Adam, Elle.

Application Number:

JP2004503699A

Publication Date:

August 18, 2005

Filing Date:

May 07, 2003

Export Citation:

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Assignee:

UNIVERSITY OF SOUTHERN CALIFORNIA

International Classes:

C25D5/02; C25D21/12; H01L21/288; H01L21/768; C25D1/00; C25D5/12; H01L21/48; H05K3/24; (IPC1-7): C25D5/02; C25D21/12

Attorney, Agent or Firm:

Yoji Ito
Takahiro Miura
Fumihiro Mizuno

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