Title:
注入角度を調整可能にするイオンビーム注入装置用の加工物支持構造体
Document Type and Number:
Japanese Patent JP2005533340
Kind Code:
A
Abstract:
An ion beam implanter includes an ion beam source for generating an ion beam moving along a beam line and a vacuum or implantation chamber wherein a workpiece is positioned to intersect the ion beam for ion implantation of a surface of the workpiece by the ion beam. The ion beam implanter further includes a workpiece support structure coupled to the implantation chamber and supporting the workpiece. The workpiece support structure includes a rotation member rotatably affixed to the implantation chamber. Rotation of the rotation member with respect to the implantation chamber changes an implantation angle of the workpiece with respect to the portion of the ion beam beam line within the implantation chamber. The workpiece support structure further includes a translation member movably coupled to the rotation member and supporting the workpiece for linear movement along a path of travel. The traslation member moves along a direction of movement such that a distance that the ion moves through the implantation chamber remains constant during movement of the workpiece along its path of travel.
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Inventors:
Ferrara, Joseph
Application Number:
JP2004520092A
Publication Date:
November 04, 2005
Filing Date:
July 10, 2003
Export Citation:
Assignee:
Axcelis Technologies, Inc.
International Classes:
H01J37/317; H01L21/265; H01L21/687; (IPC1-7): H01J37/317; H01L21/265
Attorney, Agent or Firm:
Calyx
Miyazaki Yoshio
Kaoru Onozuka
High Masahiro
Toshio Nakamura
Tsutomu Kato
Yusuke Murakoshi
Tomoaki Komiya
Miyazaki Yoshio
Kaoru Onozuka
High Masahiro
Toshio Nakamura
Tsutomu Kato
Yusuke Murakoshi
Tomoaki Komiya