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Patent Searching and Data


Title:
フォトマスク上にペリクル・アセンブリを自動的に装着するシステムおよび方法。
Document Type and Number:
Japanese Patent JP2007510937
Kind Code:
A
Abstract:
A system and method for automatically mounting a pellicle assembly on a photomask are disclosed. The method includes loading a photomask into a mounting apparatus and loading a pellicle assembly into a back plate of the mounting apparatus opposite the photomask. The back plate includes at least one load cell that measures a force applied by the mounting apparatus to the photomask and the pellicle assembly. The measured force associated with the at least one load cell is received and the pellicle assembly is mounted on the photomask to create a photomask assembly if the measured force is greater than or approximately equal to a minimum force.

Inventors:
Fly, esuan, em
Griffin, Kevin, Elle
Wills, Bert, A
Hendrickson, Peter, A
Shepra, Jennifer, M
Application Number:
JP2006534279A
Publication Date:
April 26, 2007
Filing Date:
October 05, 2004
Export Citation:
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Assignee:
Toppan, foutamasks, ink
International Classes:
G03F1/64; H01L21/027; H01L
Domestic Patent References:
JPH03156461A1991-07-04
JPH10282640A1998-10-23
JPH0588358A1993-04-09
JPH05188582A1993-07-30
JPH05150446A1993-06-18
Foreign References:
US20020112824A12002-08-22
Attorney, Agent or Firm:
Yuzo Sanada
Nobuhiko Nakajima
Ohara Shizuo