Title:
ナノ多孔質誘電体フィルムの形成方法
Document Type and Number:
Japanese Patent JP2008502786
Kind Code:
A
Abstract:
A method comprising forming a coating solution which comprises a matrix precursor material, a porogen material and a solvent, by selecting a polyarylene matrix precursor material which cross-links to form a matrix with a calculated cross-link moeity density of at least 0.003 moles/ml, and reacting the polyarylene matrix precursor material with a porogen which is linear oligomer or polymer which is formed from monomers comprising alkenyl or alkynyl functional monomers, which has reactive end groups and a weight average molecular weight in the range of less than about 5000, where the porogen is present in amounts in the range of about 10 to less than 50 percent by weight based on total weight of porogens and matrix precursor material.
Inventors:
Niu, Jason Kew.
Hanfeld, Jerry El.
Lions, John W.
Seddon, James H.
Sylvis, Craig H.
Hanfeld, Jerry El.
Lions, John W.
Seddon, James H.
Sylvis, Craig H.
Application Number:
JP2007527165A
Publication Date:
January 31, 2008
Filing Date:
June 10, 2004
Export Citation:
Assignee:
Dow Global Technologies Incorporated
International Classes:
C08J9/26; C08L65/00
Domestic Patent References:
| JP2003141956A | 2003-05-16 | |||
| JP2002530505A | 2002-09-17 | |||
| JP2003141956A | 2003-05-16 |
Attorney, Agent or Firm:
Atsushi Aoki
Takashi Ishida
Tetsuji Koga
Takashi Ishida
Tetsuji Koga