Title:
触媒膜反応器
Document Type and Number:
Japanese Patent JP2008522801
Kind Code:
A
Abstract:
Assembly, characterized in that it comprises either a dense layer (CDI), consisting of a material comprising at least 75% by volume and at most 100% by volume of a compound of formula (I): Malpha1-x-uMalpha'xMalpha''uMbeta'yMbeta''vO3-w, a porous layer (CP1), adjacent to the said dense layer (CD1), consisting of a material comprising at least 75% by volume and at most 100% by volume of a compound of formula (II): Mgamma1-x-uMgamma40 xMgamma''uMdelta1-y-vMdelta'yMdelta''vO3-w and a catalytic layer (CC1), adjacent to the said dense layer (CD1) and consisting of a material comprising at least 75% by volume and at most 100% by volume of a compound of formula (III): Mepsilon1-x-uMepsilon'xMepsilon''uMeta1-y-vMeta''vO3-w; or a dense layer (CD1), a porous layer (CP1), a catalytic layer (CC1), of thickness EC1, as defined above; and a second porous layer (CP2), inserted between the said catalytic layer (CC1) and the said dense layer (CD1), consisting of a material comprising at least 75% by volume and at most 100% by volume of a compound of formula (IV): Mtheta1-x-uMtheta'xMtheta''uMkappa1-y-vMkappa'yMkappa''vO3-w, in which assembly at least two of the chemical elements of adjacent layers are identical and one element is different. Novel reactor intended for the production of syngas by the oxidation of natural gas.
Inventors:
Dell-Garo, Pascal
Etshegoen, Gregory
Chartier, Thierry
Etshegoen, Gregory
Chartier, Thierry
Application Number:
JP2007544904A
Publication Date:
July 03, 2008
Filing Date:
December 06, 2005
Export Citation:
Assignee:
Rail Liquide-Societe Anonym Pools Retude e Rex Prosatation de Procede Georges Claude
International Classes:
B01J23/825; B01J23/835
Attorney, Agent or Firm:
Takehiko Suzue
Satoshi Kono
Makoto Nakamura
Kurata Masatoshi
Takashi Mine
Yoshihiro Fukuhara
Toshio Shirane
Sadao Muramatsu
Nobuhisa Nogawa
Katsu Sunagawa
Ryo Hashimoto
Tetsuya Kazama
Satoshi Kono
Makoto Nakamura
Kurata Masatoshi
Takashi Mine
Yoshihiro Fukuhara
Toshio Shirane
Sadao Muramatsu
Nobuhisa Nogawa
Katsu Sunagawa
Ryo Hashimoto
Tetsuya Kazama