Title:
マイクロリソグラフィ投影露光装置の照明システム
Document Type and Number:
Japanese Patent JP2009544146
Kind Code:
A
Abstract:
The disclosure relates to an illumination system of a microlithographic projection exposure apparatus, such as a an illumination system with which it is possible to set up an illumination angle-dependent polarisation state of the projection light incident on a mask, as well as related systems, components and methods.
Inventors:
Fiorca damian
Application Number:
JP2009518757A
Publication Date:
December 10, 2009
Filing Date:
July 05, 2007
Export Citation:
Assignee:
Carl Zeiss SMT AG
International Classes:
H01L21/027; G02B5/04; G02B19/00
Domestic Patent References:
| JP2006196715A | 2006-07-27 | |||
| JP2006005319A | 2006-01-05 | |||
| JP2006018292A | 2006-01-19 | |||
| JP2003090978A | 2003-03-28 | |||
| JP2007227918A | 2007-09-06 | |||
| JP2006269462A | 2006-10-05 | |||
| JP2005268489A | 2005-09-29 | |||
| JP2006196715A | 2006-07-27 | |||
| JP2006005319A | 2006-01-05 | |||
| JP2006018292A | 2006-01-19 | |||
| JP2003090978A | 2003-03-28 | |||
| JP2007227918A | 2007-09-06 | |||
| JP2006269462A | 2006-10-05 | |||
| JP2005268489A | 2005-09-29 |
Foreign References:
| WO2005050718A1 | 2005-06-02 |
Attorney, Agent or Firm:
Sadao Kumakura
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda