Title:
ウェーハレベルアーク検出のための装置と方法
Document Type and Number:
Japanese Patent JP2011527379
Kind Code:
A
Abstract:
A method and apparatus for detecting a wafer-level arc in a plasma process chamber. The method includes, for example, monitoring a waveform of a signal supplied to the plasma process chamber; detecting a feature in the waveform; responsive to detecting the feature, determining whether the waveform has stabilized after the feature; responsive to the waveform stabilizing, determining whether the feature is part of a bidirectional waveform anomaly or a unidirectional waveform transition; and recording to a computer-readable medium either an indication of the feature being part of a bidirectional waveform anomaly or an indication of the feature being a unidirectional waveform transition.
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Inventors:
Klaus, Alan Ev.
Application Number:
JP2011514738A
Publication Date:
October 27, 2011
Filing Date:
June 16, 2009
Export Citation:
Assignee:
Schneider Electric USA Inc.
International Classes:
C23C14/34; H01L21/02; H01L21/3065; H05H1/00; H05H1/46
Domestic Patent References:
| JPH1088338A | 1998-04-07 | |||
| JP2006118004A | 2006-05-11 | |||
| JP2006501683A | 2006-01-12 | |||
| JP2003318115A | 2003-11-07 | |||
| JPH0226023A | 1990-01-29 |
Foreign References:
| US20080133154A1 | 2008-06-05 |
Attorney, Agent or Firm:
Hidekazu Miyoshi
Masakazu Ito
Yuko Hara
Masakazu Ito
Yuko Hara