Title:
レジストストリッピング組成物及び電気装置を製造するための方法
Document Type and Number:
Japanese Patent JP2012526295
Kind Code:
A
Abstract:
A liquid composition free from N-alkylpyrrolidones and hydroxyl amine and its derivatives, having a dynamic shear viscosity at 50° C. of from 1 to 10 mPas as measured by rotational viscometry and comprising based on the complete weight of the composition, (A) of from 40 to 99.95% by weight of a polar organic solvent exhibiting in the presence of dissolved tetramethylammonium hydroxide (B) a constant removal rate at 50° C. for a 30 nm thick polymeric barrier anti-reflective layer containing deep UV absorbing chromophoric groups, (B) of from 0.05 to <0.5% of a quaternary ammonium hydroxide, and (C) <5% by weight of water; method for its preparation, a method for manufacturing electrical devices and its use for removing negative-tone and positive-tone photoresists and post etch residues in the manufacture of 3D Stacked Integrated Circuits and 3D Wafer Level Packagings by way of patterning Through Silicon Vias and/or by plating and bumping.
Inventors:
Clip andreas
Application Number:
JP2012508978A
Publication Date:
October 25, 2012
Filing Date:
April 20, 2010
Export Citation:
Assignee:
BASF SE
International Classes:
G03F7/42; C11D3/30; C11D3/36; C11D3/43; C11D7/32; C11D7/34; C11D7/50; C11D17/08; H01L21/027; H01L21/304
Domestic Patent References:
| JPH10239865A | 1998-09-11 | |||
| JP2005031682A | 2005-02-03 | |||
| JP2005181802A | 2005-07-07 | |||
| JP2004133153A | 2004-04-30 |
Foreign References:
| WO2009046637A1 | 2009-04-16 |
Attorney, Agent or Firm:
Satoshi Eto