Title:
逆傾斜の側壁を有するメサ構造へのレーザー直接書き込みシステム
Document Type and Number:
Japanese Patent JP2014500523
Kind Code:
A
Abstract:
In the field of photolithography systems designed to produce electronic components using the technique known as "lift-off" on a plane substrate comprising one or more plane photosensitive layers, a system uses a laser direct-write technique. It comprises optical or mechanical means configured such that the useful part of the optical beam is inclined on the plane of the photosensitive layers in order to create profiles with an inverted slope within said layers, the useful part of the optical beam being the part of the optical beam which effectively contributes to creating said profiles. In one preferred embodiment, the system comprises means for partial shuttering of the optical beam situated in the neighborhood of the focusing optics.
Inventors:
Della, Olivier
Fusier, Pascal
Teve, Zoe
Fusier, Pascal
Teve, Zoe
Application Number:
JP2013535359A
Publication Date:
January 09, 2014
Filing Date:
October 18, 2011
Export Citation:
Assignee:
Comicilia Arenergy Atomic Eo Energy Alternatives
International Classes:
H01L21/027; G03F7/20
Domestic Patent References:
| JP2010199115A | 2010-09-09 | |||
| JP2008197479A | 2008-08-28 |
Attorney, Agent or Firm:
Takahisa Kimura