Title:
PROJECTION EXPOSURE METHOD AND PROJECTION EXPOSURE APPARATUS FOR MICROLITHOGRAPHY
Document Type and Number:
Japanese Patent JP2019164351
Kind Code:
A
Abstract:
To provide a projection exposure method capable of improved near-instantaneous fine optimization of the imaging properties.SOLUTION: A projection exposure method includes the steps of: holding a mask between an illumination system and a projection lens of a projection exposure apparatus so that a pattern is arranged in the region of the object plane of the projection lens; holding a substrate so that a radiation-sensitive surface of the substrate is arranged in a region of an image plane of the projection lens, the image plane being optically conjugated with respect to the object plane; illuminating an illumination region of the mask with an illumination radiation provided by the illumination system; and projecting a part of the pattern lying in the illumination region onto an image field at the substrate with the aid of the projection lens, wherein all rays of the projection radiation which contribute to image generation in the image field form a light quiver in the projection lens. The method includes the steps of: determining at least one light quiver parameter which describes a property of the light quiver; and controlling operation of the projection exposure apparatus by taking account of the light quiver parameter.SELECTED DRAWING: Figure 2
Inventors:
GRAESCHUS VOLKER
TORALF GRUNER
TORALF GRUNER
Application Number:
JP2019056218A
Publication Date:
September 26, 2019
Filing Date:
March 25, 2019
Export Citation:
Assignee:
ZEISS CARL SMT GMBH
International Classes:
G03F7/20; G02B7/185; G02B17/00
Domestic Patent References:
| JP2010541259A | 2010-12-24 | |||
| JP2009206274A | 2009-09-10 | |||
| JP2010123790A | 2010-06-03 | |||
| JP2011192900A | 2011-09-29 | |||
| JP2010141071A | 2010-06-24 | |||
| JP2010502027A | 2010-01-21 | |||
| JP2005328050A | 2005-11-24 |
Foreign References:
| WO2011051069A1 | 2011-05-05 |
Attorney, Agent or Firm:
Shinichiro Tanaka
Hiroyuki Suda
Fumiaki Otsuka
Takaki Nishijima
Naoki Kondo
Takeo Nasu
Hiroshi Oura
Hiroyuki Suda
Fumiaki Otsuka
Takaki Nishijima
Naoki Kondo
Takeo Nasu
Hiroshi Oura