Title:
MANUFACTURING METHOD OF COPOLYMER
Document Type and Number:
Japanese Patent JP2019167466
Kind Code:
A
Abstract:
To provide a method for effectively and economically manufacturing a novel copolymer suitable for a film having high step difference even in a thin film.SOLUTION: There is provided a manufacturing method of a copolymer including polymerizing a monomer containing one or more kind of monomer A selected from a group consisting of α-cyano cinnamic acid ester, benzal malononitrile, nitrobenzal malononitrile, cinnamonitrile, chalcone, alkoxychalcone, benzylidenmalonic acid diester, N,N-dialkyl cinnamamide, and a monomer B (vinyl carbazole) by using an oil soluble radical initiator in a solvent represented by the general formula (3). Rand Rrepresent each independently hydrogen, a branched alkyl group having 1 to 12 carbon atoms, or a cyclic alkyl group having 3 to 6 carbon atoms, an acyl group having 1 to 12 carbon atoms, Rrepresents hydrogen, a branched alkyl group having 1 to 12 carbon atoms, a cyclic alkyl group having 3 to 6 carbon atoms.SELECTED DRAWING: None
Inventors:
KITAGAWA TAKAHIRO
ITO SAKI
FUJII YASUYOSHI
ITO SAKI
FUJII YASUYOSHI
Application Number:
JP2018057040A
Publication Date:
October 03, 2019
Filing Date:
March 23, 2018
Export Citation:
Assignee:
TOSOH CORP
International Classes:
C08F226/12; C08F2/06; G02B5/30
Domestic Patent References:
| JP2010031186A | 2010-02-12 | |||
| JP2017037108A | 2017-02-16 | |||
| JP2010250110A | 2010-11-04 |