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Title:
PHOTOSENSITIVE RESIN COMPOSITION, STRUCTURE, OPTICAL COMPONENT AND METHOD FOR PRODUCING OPTICAL COMPONENT
Document Type and Number:
Japanese Patent JP2020024270
Kind Code:
A
Abstract:
To provide a technique for a photosensitive resin composition that stably exhibits light resistance.SOLUTION: A photosensitive resin composition contains a polymer containing a cyclic olefin-derived structural unit, a naphthoquinone diazide compound of a specific structure (B), and a crosslinker (C).SELECTED DRAWING: None

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Inventors:
TSUCHIYA EIKO
Application Number:
JP2018148012A
Publication Date:
February 13, 2020
Filing Date:
August 06, 2018
Export Citation:
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Assignee:
SUMITOMO BAKELITE CO
International Classes:
G03F7/023; C08F32/00; G02F1/1333; G03F7/004; G03F7/075
Domestic Patent References:
JP2015176067A2015-10-05
Foreign References:
WO2007063721A12007-06-07
Attorney, Agent or Firm:
Shinji Hayami



 
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