Title:
CHEMICAL LIQUID ADMINISTRATION DEVICE AND CHEMICAL LIQUID INJECTION CONTROLLER USED FOR CHEMICAL LIQUID ADMINISTRATION DEVICE
Document Type and Number:
Japanese Patent JP2020039761
Kind Code:
A
Abstract:
To provide a chemical liquid administration device of a novel structure capable of easily performing the priming work of a sub line provided for rapid administration of chemical liquid.SOLUTION: A chemical liquid administration device 10 is provided with (i) a priming air vent portion 62 provided downstream from at least one of a sub-reservoir 42 and a flow rate control unit 38, and (ii) a priming shutoff valve 140 provided downstream from the priming air vent portion 62, as a priming mechanism for priming a sub line 26.SELECTED DRAWING: Figure 2
Inventors:
SAKAMOTO SHINGO
Application Number:
JP2018171123A
Publication Date:
March 19, 2020
Filing Date:
September 13, 2018
Export Citation:
Assignee:
NIPRO CORP
International Classes:
A61M5/31
Domestic Patent References:
| JP2014502525A | 2014-02-03 | |||
| JP2007111179A | 2007-05-10 | |||
| JP2000262613A | 2000-09-26 | |||
| JP2010227144A | 2010-10-14 |
Foreign References:
| WO2017098685A1 | 2017-06-15 |
Attorney, Agent or Firm:
Kasai Nakane International Patent Office
Yoshitaka Kasai
Nakane Mie
Yoshitaka Kasai
Nakane Mie