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Title:
FLUORESCENT X-RAY ANALYSIS SYSTEM, FLUORESCENT X-RAY ANALYZER AND FLUORESCENT X-RAY ANALYSIS METHOD
Document Type and Number:
Japanese Patent JP2020085826
Kind Code:
A
Abstract:
To provide a fluorescent X-ray analysis system, a fluorescent X-ray analyzer and a fluorescent X-ray analysis method which are capable of specifying a measurement position of a sample while realizing high-accuracy measurement.SOLUTION: An imaging part 20 is arranged on the opposite side from an X-ray source 7 and a detector 8 with a sample mount 2 laid between them, and acquires a first to fourth images before measurement. The first image is the entire image of an opening 4, the second image is the entire image of surface SA, and the third image is the entire image of a rear face SB. The fourth image is the entire image of the rear face SB in the state where the sample S is mounted on the sample mount 2 such that a measurement position is exposed from the opening 4. An information processor 14 specifies the position of the opening 4 on the surface SA in the state where the sample S is mounted on the sample mount 2 such that the measurement position is exposed from the opening 4 on the basis of the first to fourth images acquired by the imaging part 20, and creates a composite image formed by composing the entire image of the surface SA and a contour image of the opening 4 on the basis of the specified position of the opening 4.SELECTED DRAWING: Figure 1

Inventors:
SUZUKI KEIJIRO
Application Number:
JP2018224802A
Publication Date:
June 04, 2020
Filing Date:
November 30, 2018
Export Citation:
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Assignee:
SHIMADZU CORP
International Classes:
G01N23/223; G01N23/2204
Domestic Patent References:
JP2009025241A2009-02-05
JPH1137960A1999-02-12
Foreign References:
WO2018110254A12018-06-21
WO2018110260A12018-06-21
Attorney, Agent or Firm:
Fukami patent office