Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
METHOD OF MANUFACTURING CLOTH WITH PRINTED PATTERN, AND CLOTH WITH PRINTED PATTERN
Document Type and Number:
Japanese Patent JP2020169398
Kind Code:
A
Abstract:
To provide cloth with a printed pattern, on which cloth the coating film constituting the printed pattern is not inconsistent in the thickness, and which printed pattern emits phosphorescence in the dark, and easily expands and contracts as the cloth expands and contracts, and also to provide a method of manufacturing the cloth.SOLUTION: The present invention relates to a method of manufacturing cloth with a printed pattern, which printed pattern comprises a silicone ink and a phosphorescent material, the method including: screen-printing a mixture of the silicone ink not yet cured and the phosphorescent material onto the cloth such that a coating film with thickness of 0.7 mm or less is obtained; and curing the printed pattern. Also described herein is cloth with a printed pattern, which printed pattern comprises a silicone ink and a phosphorescent material, and which printed pattern has a thickness of 0.7 mm or less.SELECTED DRAWING: Figure 1

Inventors:
FUJII SHIGERU
Application Number:
JP2019069760A
Publication Date:
October 15, 2020
Filing Date:
April 01, 2019
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
FUJITEC KK
International Classes:
D06P5/00; C09D11/037; C09D11/102
Domestic Patent References:
JP2005212451A2005-08-11
JPH0939365A1997-02-10
JP2017164950A2017-09-21
JP2014173195A2014-09-22
JP2015506387A2015-03-02
JPH11124780A1999-05-11
JP2018111223A2018-07-19
Foreign References:
KR20120041887A2012-05-03
Attorney, Agent or Firm:
Toshio Mori
Hirosaburo Mori
Atsushi Kimura
Hideaki Tanaka