Title:
SILICON-CONTAINING UNDERLAYERS
Document Type and Number:
Japanese Patent JP2020180292
Kind Code:
A
Abstract:
To provide excellent polymeric silicon-containing underlayers.SOLUTION: The invention provides methods of manufacturing electronic devices employing wet-strippable underlayer compositions comprising one or more condensed polymers having an organic polymer chain having pendently-bound moieties having an acidic proton and a pKa in water from -5 to 13 and having pendently-bound siloxane moieties.SELECTED DRAWING: None
Inventors:
LI CUI
PAUL J LABEAUME
JAMES F CAMERON
CHARLOTTE A CUTLER
YAMADA SHINTARO
SUZANNE M COLEY
KE IOU-SHENG
PAUL J LABEAUME
JAMES F CAMERON
CHARLOTTE A CUTLER
YAMADA SHINTARO
SUZANNE M COLEY
KE IOU-SHENG
Application Number:
JP2020116081A
Publication Date:
November 05, 2020
Filing Date:
July 06, 2020
Export Citation:
Assignee:
ROHM & HAAS ELECT MAT
International Classes:
C08G77/48; C08F220/06; C08F220/12; C08F230/08; G03F7/11; G03F7/42
Domestic Patent References:
| JP2008076889A | 2008-04-03 | |||
| JP2010122322A | 2010-06-03 | |||
| JP2017111441A | 2017-06-22 | |||
| JP2005154587A | 2005-06-16 | |||
| JP2017020000A | 2017-01-26 |
Foreign References:
| WO2015137438A1 | 2015-09-17 | |||
| WO1999009457A1 | 1999-02-25 |
Other References:
"Preparation of Nanosilica-Modified Negative-Type Acrylate Photoresist", JOURNAL OF APPLIED POLYMER SCIENCE, vol. 107, JPN6022027220, 9 October 2007 (2007-10-09), US, pages 1179 - 1188, ISSN: 0004818260
Attorney, Agent or Firm:
Patent Business Corporation Sender International Patent Office