Title:
EXPOSURE DEVICE, AND ARTICLE MANUFACTURING METHOD
Document Type and Number:
Japanese Patent JP2020197609
Kind Code:
A
Abstract:
To provide an exposure device advantageous in high accuracy prediction of variation of an imaging property of a projection optic system.SOLUTION: The exposure device includes: a projection optical system for projecting a pattern of a mask on a substrate; an adjustment part for adjusting an imaging property of the projection optical system; and a control part for exposing the substrate by controlling the adjustment part based on a result of the prediction, by predicting the variation of the imaging property generated by absorption of exposure energy of the projection optical system according to a prediction formula. The control part has a mode of measuring the imaging property before exposure of the respective substrates in a job where exposure of the plurality of substrates is sequentially performed and renewing a prediction coefficient in the prediction formula based on the result of each measurement after the end of the job, and, in the mode, measures the imaging property of not only within an exposure image angle set in the job but also outside of the exposure angle set in the job.SELECTED DRAWING: Figure 2
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Inventors:
KOIZUMI RYO
Application Number:
JP2019103169A
Publication Date:
December 10, 2020
Filing Date:
May 31, 2019
Export Citation:
Assignee:
CANON KK
International Classes:
G03F7/20
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Attorney, Agent or Firm:
Yasunori Otsuka
Yasuhiro Otsuka
Shiro Takayanagi
Shuji Kimura
Osamu Shimoyama
Nagakawa Yukimitsu
Yasuhiro Otsuka
Shiro Takayanagi
Shuji Kimura
Osamu Shimoyama
Nagakawa Yukimitsu