Title:
THIN FILM MANUFACTURING METHOD
Document Type and Number:
Japanese Patent JP2021006841
Kind Code:
A
Abstract:
To provide a thin film manufacturing method capable of, in forming a pattern on a thin film, preventing a mask from being abraded and defected in dry etching of a mask member to be adopted, and forming fine pores with microstructure highly accurately.SOLUTION: A thin film manufacturing method is a manufacturing method of a thin film having pores, and includes: forming a thin film on a substrate, then stacking on the thin film a first mask composed of an at least self-organization material, and a second mask more resistant to reactive etching treatment or physical etching treatment than the first mask in this order, and forming fine pores in the thin film by dry etching treatment.SELECTED DRAWING: Figure 1
Inventors:
KASUYA JINICHI
TADA KAZUNARI
MIZUMACHI YASUSHI
TADA KAZUNARI
MIZUMACHI YASUSHI
Application Number:
JP2019120509A
Publication Date:
January 21, 2021
Filing Date:
June 27, 2019
Export Citation:
Assignee:
KONICA MINOLTA INC
International Classes:
G02B1/115; C23C14/06; G02B1/18
Domestic Patent References:
| JP2015227904A | 2015-12-17 | |||
| JP2008168610A | 2008-07-24 | |||
| JP2008047822A | 2008-02-28 | |||
| JPS6260224A | 1987-03-16 | |||
| JP2006245342A | 2006-09-14 | |||
| JP2003287601A | 2003-10-10 | |||
| JP2000036243A | 2000-02-02 |
Foreign References:
| WO2016170727A1 | 2016-10-27 | |||
| WO2017056598A1 | 2017-04-06 |
Other References:
西浦 真治、他: "島状金属膜の電気抵抗", 応用物理, vol. 第44巻 第１号, JPN6023022346, 10 January 1975 (1975-01-10), JP, pages 71 - 77, ISSN: 0005076058
Attorney, Agent or Firm:
Gwangyang International Patent Office