SALT, ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN

Title:

SALT, ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN

Document Type and Number:

Japanese Patent JP2021011480

Kind Code:

A

Abstract:

To provide a salt capable of producing a resist pattern having a good mask error factor (MEF), and a resist composition containing the salt.SOLUTION: The salt represented by formula (I), an acid generator, and the resist composition are provided. [In the formula, R1 represents an alkyl group; R2 represents a halogen atom or a fluorinated alkyl group; R3 represents a halogen atom, a fluorinated alkyl group or an alkyl group; m3 represents an integer of 0-3; R4 and R5 each represent a hydrogen atom, a hydroxy group or a hydrocarbon group; m4 and m5 each represent an integer of 1-3; X represents a single bond, -CH2-, -CO-, -O- or -S-; and AI- represents an organic anion.]SELECTED DRAWING: None

More Like This:

JP2010510980	Pharmaceutical composition containing a naphthoquinone-based compound for the intestinal delivery system
JPH1180140	PRODUCTION OF BENZOOXAZOLIUM DERIVATIVE
WO/2023/013592	RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

Inventors:

ADACHI YUKAKO
ARAKI KO
ICHIKAWA KOJI

Application Number:

JP2020116534A

Publication Date:

February 04, 2021

Filing Date:

July 06, 2020

Export Citation:

Click for automatic bibliography generation Help

Assignee:

SUMITOMO CHEMICAL CO

International Classes:

C07D327/06; C07C309/17; C08F20/10; G03F7/004; G03F7/038; G03F7/039; G03F7/20

Attorney, Agent or Firm:

Shinki Global IP Patent Corporation

Previous Patent: カルボン酸塩、カルボン酸発生剤、レジスト組成物及びレジストパターン�...

Next Patent: カルボン酸塩、カルボン酸発生剤、レジスト組成物及びレジストパターン�...