Title:
FLOW RATE ADJUSTMENT METHOD AND PRESSURE ADJUSTMENT METHOD
Document Type and Number:
Japanese Patent JP2021045798
Kind Code:
A
Abstract:
To improve working efficiency of an operator when adjusting a flow rate of fluid supplied to a supply part from a fluid supply source in a processing device.SOLUTION: There is provided a processing device 1, including: fluid supply means 7 which has a pipe 71 for communicating between a supply part 70 and a fluid supply source 79 supplied with the fluid, a throttle valve 72 for varying a flow rate of the fluid flowing in the pipe 71 and a flow rate sensor 73 for detecting the flow rate of the fluid flowing in the pipe 71 between the supply part 70 and the throttle valve 72; and control means 9 which has a setting part 90 for setting a regulated preset flow rate value of the fluid and an electric conduction part 91 for ringing a sound by a loudspeaker 99 by electrically conducting to the loudspeaker 99 by a flow rate value detected by the flow rate sensor 73 by changing an opening of the throttle valve 72 to the preset flow rate value. There is also provided a flow rate adjustment method for adjusting a flow rate of the fluid supplied by the means 7 for supplying the fluid to a workpiece W or a processing tool 164, the method including a process of adjusting the flow rate of the fluid supplied to the supply part 70 by hearing the sound of the loudspeaker 99 by changing the opening of the throttle valve 72.SELECTED DRAWING: Figure 1
Inventors:
KOSHIOKA YUJI
Application Number:
JP2019168192A
Publication Date:
March 25, 2021
Filing Date:
September 17, 2019
Export Citation:
Assignee:
DISCO ABRASIVE SYSTEMS LTD
International Classes:
B24B55/02
Attorney, Agent or Firm:
Patent Business Corporation Tokyo Alpa Patent Office