Title:
PATTERN INSPECTION METHOD, INSPECTION DEVICE FOR PHOTOMASK, MANUFACTURING METHOD FOR PHOTOMASK, AND MANUFACTURING METHOD FOR DISPLAY DEVICE
Document Type and Number:
Japanese Patent JP2021056293
Kind Code:
A
Abstract:
To provide a method for stably and highly accurately measuring a line width even in a fine width pattern.SOLUTION: A pattern inspection method includes: a step of irradiating an inspection region with light, and acquiring a transmission light image of the inspection region; a step of obtaining light intensity distribution data of the inspection region from the acquired transmission light image; a differential processing step of subjecting a light intensity distribution curve determined from the light intensity distribution data to differential processing, and thereby obtaining a light intensity change curve in a region including a first boundary that is a boundary portion between a first transmission control part and a second transmission control part and a second boundary that is a boundary portion between the second transmission control part and a third transmission control part; a fitting step of fitting the obtained light intensity change curve to a model function; and a step of determining a dimension of the second transmission control part from the result of fitting.SELECTED DRAWING: Figure 5
Inventors:
OZAKI TAICHI
Application Number:
JP2019176892A
Publication Date:
April 08, 2021
Filing Date:
September 27, 2019
Export Citation:
Assignee:
HOYA CORP
International Classes:
G03F1/84; G01B11/02; G03F1/26
Domestic Patent References:
| JP2008165216A | 2008-07-17 | |||
| JPH07135244A | 1995-05-23 | |||
| JP2011069873A | 2011-04-07 | |||
| JPH05107741A | 1993-04-30 | |||
| JP2013235036A | 2013-11-21 | |||
| JP2001175857A | 2001-06-29 | |||
| JP2016050794A | 2016-04-11 |
Foreign References:
| US20120061349A1 | 2012-03-15 |
Attorney, Agent or Firm:
Aniya Setsuo
Fukuoka Masahiro
Okuyama Tomohiro
Hideo Tachibana
Fukuoka Masahiro
Okuyama Tomohiro
Hideo Tachibana