Title:
VAPOR DEPOSITION MASK MANUFACTURING APPARATUS
Document Type and Number:
Japanese Patent JP2021119265
Kind Code:
A
Abstract:
To reduce manufacturing cost in an apparatus, and to reduce dispersion of alignment accuracy, in a mask manufacturing apparatus in which a mask is fixed to a frame.SOLUTION: A mask manufacturing apparatus in which a vapor deposition mask is fixed in accordance with one of a plurality of openings, on a frame provided with the plurality of openings, includes an alignment stage having a placing part where the vapor deposition mask is placed, and an alignment mechanism for aligning by moving the vapor deposition mask along a surface facing to the vapor deposition mask on the frame.SELECTED DRAWING: Figure 1
Inventors:
NARUTANI MOTOTSUGU
TAKEDA ATSUSHI
TAKEDA ATSUSHI
Application Number:
JP2021076262A
Publication Date:
August 12, 2021
Filing Date:
April 28, 2021
Export Citation:
Assignee:
JAPAN DISPLAY INC
International Classes:
C23C14/04; H01L51/50; H05B33/10
Domestic Patent References:
| JP2002305081A | 2002-10-18 | |||
| JP2009217008A | 2009-09-24 | |||
| JPH11307423A | 1999-11-05 |
Attorney, Agent or Firm:
Haruka International Patent Office