Title:
HOLDING PAD, METHOD FOR MANUFACTURING THE SAME, AND METHOD FOR MANUFACTURING POLISHED PRODUCT
Document Type and Number:
Japanese Patent JP2021146461
Kind Code:
A
Abstract:
To provide a holding pad which can impart good flatness and end shape to a polished product after polishing.SOLUTION: A holding pad has a resin sheet having a holding surface for holding a polished object, in which the resin sheet has air bubbles therein, a wall ratio W100 of the resin at a depth of 100 μm from the holding surface is 20.0% or more and 40.0% or less, the holding surface has an aperture having an average opening diameter of 20 μm or more and 50 μm or less, an aperture rate of the holding surface is 20% or more and 40% or less, and water penetration time when water of 1.0 μL is dropped onto the holding surface is 500 seconds or longer and 1,500 seconds or shorter.SELECTED DRAWING: Figure 1
Inventors:
KIRAKU YUKI
YAMADA TATSUYA
YOSHIDA TAKUMA
MORI JUNYA
YAMADA TATSUYA
YOSHIDA TAKUMA
MORI JUNYA
Application Number:
JP2020049551A
Publication Date:
September 27, 2021
Filing Date:
March 19, 2020
Export Citation:
Assignee:
FUJIBO HOLDINGS INC
International Classes:
B24B37/30; H01L21/304
Attorney, Agent or Firm:
Yoshiyuki Inaba
Toshifumi Onuki
Akihiko Eguchi
Kazuhiko Naito
Toshifumi Onuki
Akihiko Eguchi
Kazuhiko Naito