Title:
METROLOGY APPARATUS AND METHOD OF CALCULATING CHARACTERISTIC OF INTEREST
Document Type and Number:
Japanese Patent JP2022186712
Kind Code:
A
Abstract:
To provide a metrology apparatus and method for calculating a characteristic of interest relating to at least one structure on a substrate.SOLUTION: The metrology apparatus comprises a sensor and an optical system. The sensor is for detecting characteristics of radiation impinging on the sensor. The optical system comprises an illumination path and a detection path. The optical system is configured to illuminate the at least one structure with radiation received from a light source via the illumination path. The optical system is configured to receive radiation scattered by the at least one structure and to transmit the received radiation to the sensor via the detection path.SELECTED DRAWING: Figure 4
Inventors:
Den Beauf, Ally, Jeffrey
Van den Woutelaar, Ronald, Joseph, Antonius
Van den Woutelaar, Ronald, Joseph, Antonius
Application Number:
JP2022154319A
Publication Date:
December 15, 2022
Filing Date:
September 28, 2022
Export Citation:
Assignee:
ASM L Netherlands B.V.
International Classes:
G03F7/20; G03F9/00
Attorney, Agent or Firm:
Yoshiyuki Inaba
Toshifumi Onuki
Akihiko Eguchi
Kazuhiko Naito
Toshifumi Onuki
Akihiko Eguchi
Kazuhiko Naito