Title:
PHOTOCURABLE RESIN COMPOSITION
Document Type and Number:
Japanese Patent JP2022187293
Kind Code:
A
Abstract:
To provide a photocurable resin composition which is suppressed in glossiness when applied onto a base material, is extremely reduced in damage when brought into contact with chemical, and enables easy wiping of stain attached to the photocurable resin composition.SOLUTION: A photocurable resin composition is provided, containing polyfunctional (meth)acrylate (A), polypropylene-treated silica particles (B), a surface conditioner (C), and a photopolymerization initiator (D), wherein a polyfunctional (meth)acrylate monomer (a1) and a polyfunctional (meth)acrylate oligomer (a2) are usable as the polyfunctional (meth)acrylate (A).SELECTED DRAWING: None
Inventors:
KATO HIROSHI
Application Number:
JP2021095251A
Publication Date:
December 19, 2022
Filing Date:
June 07, 2021
Export Citation:
Assignee:
AICA KOGYO CO LTD
International Classes:
C08F2/44; C08F2/50; C08F292/00; C08K9/04; C08L51/10; C08L83/04
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