Title:
GAS TREATMENT APPARATUS AND SUBSTRATE PROCESSING APPARATUS
Document Type and Number:
Japanese Patent JP2022188853
Kind Code:
A
Abstract:
To reduce the usage of a solution.SOLUTION: A gas treatment apparatus comprises: a duct; a partition plate; and a liquid supply part. The duct comprises therein a flow passage through which gas flows. The partition plate is a partition plate that divides the flow passage into a plurality of spaces and made of a porous material that can transmit gas and hold liquid. The liquid supply part supplies, to the partition plate, a solution that can dissolve an object component contained in the gas. The gas treatment apparatus causes the gas flowing through the flow passage to contact the solution held in the partition plate.SELECTED DRAWING: Figure 4
Inventors:
TSUGAO KEISUKE
AOKI DAISUKE
AOKI DAISUKE
Application Number:
JP2021097099A
Publication Date:
December 22, 2022
Filing Date:
June 10, 2021
Export Citation:
Assignee:
TOKYO ELECTRON LTD
International Classes:
H01L21/304; B01D53/18; B01D53/68; B01D53/72; B01D53/78
Attorney, Agent or Firm:
Sakai International Patent Office