Title:
【発明の名称】有磁場プラズマエッチング装置
Document Type and Number:
Japanese Patent JP2550368
Kind Code:
B2
Inventors:
KAKEHI YUTAKA
OOMOTO YUTAKA
UEYAMA KEIJI
KAWASAKI YOSHINAO
OOMOTO YUTAKA
UEYAMA KEIJI
KAWASAKI YOSHINAO
Application Number:
JP29527087A
Publication Date:
November 06, 1996
Filing Date:
November 25, 1987
Export Citation:
Assignee:
HITACHI LTD
International Classes:
H01L21/302; C23F4/00; H01L21/3065; H05H1/46; (IPC1-7): H01L21/3065; H05H1/46
Domestic Patent References:
| JP5684476A | ||||
| JP61163639A | ||||
| JP62224935A | ||||
| JP6011109B2 |
Attorney, Agent or Firm:
Katsuo Ogawa (1 person outside)