Title:
【発明の名称】オープン-チューブ型不純物拡散装置
Document Type and Number:
Japanese Patent JP2831168
Kind Code:
B2
Abstract:
An open-tube type impurity diffusion apparatus for simultaneously diffusing impurities into a plurality of wafers in a same controlled environment. The apparatus includes a diffusion box including a diffusion source, a diffusion box for holding a plurality of wafers, a slider including a body having a perforated portion and non-perforated portion and heaters disposed in a furnace. Because the apparatus can be used to simultaneously diffuse impurities into a plurality of wafers once, a mass of semiconductors can be produced, production cost and time can be decreased, and deviation of the wafer characteristics from wafer to wafer within a batch can be minimized.
Inventors:
HO TOSHU
KIN SHUNEI
KIN SHUNEI
Application Number:
JP17952291A
Publication Date:
December 02, 1998
Filing Date:
July 19, 1991
Export Citation:
Assignee:
SANSEI DENSHI KK
International Classes:
C23C8/10; H01L21/22; (IPC1-7): H01L21/22; H01L21/22
Domestic Patent References:
| JP59135723A |
Attorney, Agent or Firm:
Akira Asamura (2 outside)