Title:
【発明の名称】真空装置
Document Type and Number:
Japanese Patent JP2837205
Kind Code:
B2
Abstract:
PCT No. PCT/GB88/01105 Sec. 371 Date Oct. 12, 1989 Sec. 102(e) Date Oct. 12, 1989 PCT Filed Dec. 14, 1988 PCT Pub. No. WO89/05689 PCT Pub. Date Jun. 29, 1989.The present invention provides an apparatus having a high vacuum environment and a plurality of components located within the high vacuum environment so as to be exposed to high vacuum. At least one of the plurality of components is formed from a plastic material comprising liquid crystal polymer to prevent outgassing of the plastics material in the high vacuum environment.
Inventors:
DO HAAN HERU
Application Number:
JP50079089A
Publication Date:
December 14, 1998
Filing Date:
December 14, 1988
Export Citation:
Assignee:
BII OO SHII GURUUPU PLC ZA
International Classes:
B01J3/00; B29C67/24; C08G63/60; C08J5/04; C08L67/00; H01L29/73; F04B37/14; H01L21/02; H01L21/285; H01L21/331; H01L21/60; H01L21/76; H01L21/762; H01L21/768; H01L21/822; H01L21/8222; H01L23/522; H01L27/04; H01L27/06; (IPC1-7): B01J3/00; C08J5/04; F04B37/14
Domestic Patent References:
| JP63223372A | ||||
| JP62278514A | ||||
| JP6330326U |
Attorney, Agent or Firm:
Minoru Nakamura (7 outside)