Title:
【発明の名称】高純度金属クロムの製造方法
Document Type and Number:
Japanese Patent JP3002265
Kind Code:
B2
Abstract:
PURPOSE:To obtain high-purity metallic chromium for producing a sputtering target for thin film by using a chromium trioxide soln. contg. hydrogen fluoride as an electrolyte and specifying the electrolyte temp. CONSTITUTION:A soln. contg. 200-500g/l of chromium trioxide (CrO3) and hydrogen fluoride in a(100: 1)-(100:2) weight ratio of Cr to F is used as an electrolyte. The electrolyte is held at <=70 deg.C, and electrolysis is performed. The obtained electrodeposited metal is heated at >=1000 deg.C in a reducing atmosphere. Consequently, the oxygen content of electrodeposited chromium is reduced to <=about 100ppm, and metallic chromium having about 99.99% purity is obtained.
Inventors:
Kaoru Araki
Kunikira Suzuki
Yoshinori Yoshizawa
Nobuyuki Saito
Kunikira Suzuki
Yoshinori Yoshizawa
Nobuyuki Saito
Application Number:
JP40170890A
Publication Date:
January 24, 2000
Filing Date:
December 12, 1990
Export Citation:
Assignee:
Nippon Heavy Chemical Co., Ltd.
International Classes:
C25C1/10; (IPC1-7): C25C1/10
Domestic Patent References:
| JP57140897A | ||||
| JP3260098A |
Attorney, Agent or Firm:
Yuji Miura