Title:
【発明の名称】位相シフトマスク、位相シフトマスクブランク及び位相シフト部材形成用ターゲット
Document Type and Number:
Japanese Patent JP3172527
Kind Code:
B2
Inventors:
Norimichi Annaka
Application Number:
JP26213890A
Publication Date:
June 04, 2001
Filing Date:
September 28, 1990
Export Citation:
Assignee:
Hoya Co., Ltd.
International Classes:
H01L21/027; G03F1/30; G03F1/68; (IPC1-7): H01L21/027; G03F1/08
Domestic Patent References:
| JP6292438A |
Attorney, Agent or Firm:
Setsuo Aniya (2 outside)