Title:
スパッタリング用ターゲットの製造方法
Document Type and Number:
Japanese Patent JP3827725
Kind Code:
B2
Abstract:
A process for producing sputtering targets, which comprises molding a mixture of a powder of a high-melting substance having a melting point of 900 DEG C or above with a powder of a low-melting metal having a melting point of 700 DEG C or below at a temperature below the melting point of the low-melting metal under heat and pressure.
Inventors:
Jin Nakagama
Kusada Masao
Atsushi Hayashi
Kusada Masao
Atsushi Hayashi
Application Number:
JP53436996A
Publication Date:
September 27, 2006
Filing Date:
May 17, 1996
Export Citation:
Assignee:
Asahi Glass Ceramics Co., Ltd.
International Classes:
C23C14/34
Domestic Patent References:
| JP63128141A |
Attorney, Agent or Firm:
Mamoru Tsunoda