Title:
シリコンを含有する感光性ポリマー及びこれを含むレジスト組成物
Document Type and Number:
Japanese Patent JP3990146
Kind Code:
B2
Abstract:
A photosensitive polymer including a copolymer of an acrylate or methacrylate monomer having a group indicated by the following formula (I), a comonomer selected from a maleic anhydride monomer and a cyclic vinyl ether monomer, and a resist composition including the same.In the formula, R1, R2, R3, and R4 are independently a hydrogen atom, a C1-C4 alkyl group, a C1-C4 alkoxy group, a phenyl group, a benzyl group, a phenoxy group, or -M(R')3, M is Si, Ge, Sn, or OSi, and each R' independently is a C1-C4 alkyl group, a C1-C4 alkoxy group, a phenyl group, or a phenoxy group.
Inventors:
Kim wise friend
Common sense
Common sense
Application Number:
JP2001380605A
Publication Date:
October 10, 2007
Filing Date:
December 13, 2001
Export Citation:
Assignee:
Samsung Electronics Co.,Ltd.
International Classes:
C08F222/06; C08F230/04; G03F7/039; C08F234/02; G03F7/004; G03F7/075; H01L21/027
Domestic Patent References:
| JP9185166A | ||||
| JP8137104A | ||||
| JP7077800A | ||||
| JP10288839A | ||||
| JP2000336119A | ||||
| JP10309455A |
Foreign References:
| US6103448 |
Other References:
Jin-Beak Kim et al.,Chemically amplified resists based on the norbornene polymer with 2-trimethylsilyl-2-propyl ester protecting group,Proceedings of SPIE (Advances in Resist Technology and Processing XVII),米国,The International Society for Optical Enginnering,2000年 2月28日,3999(Pt.2),1079-1087
社団法人高分子学会編,高分子科学の基礎(第2版),日本,株式会社東京化学同人,1994年 3月25日,p.117
社団法人高分子学会編,高分子科学の基礎(第2版),日本,株式会社東京化学同人,1994年 3月25日,p.117
Attorney, Agent or Firm:
Mikio Hatta
Atsushi Nogami
Yasuo Nara
Etsuko Saito
Katsuyuki Utani
Atsushi Nogami
Yasuo Nara
Etsuko Saito
Katsuyuki Utani