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Title:
大気圧で低温プラズマを発生させる装置
Document Type and Number:
Japanese Patent JP3990285
Kind Code:
B2
Abstract:
Disclosed is an apparatus for generating low-temperature plasma at atmospheric pressure, comprising: a couple of electrodes facing each other at a distance, one of them being connected to a power supply, the other being grounded; a couple of dielectrics with a thickness of 25 mu m-10 mm, positioned on the facing surfaces of the electrodes in such a way as to face each other, one of them having at least one discharge gap therein; and a conductor electrode having at least one tip positioned within the discharge gap, wherein an electric field is applied at an intensity of 1-100 KV/cm through the power supply across the electrodes by use of a pulse direct current or an alternating current in a frequency bandwidth of 50 Hz-10 GHz while a reaction gas is fed between the electrodes, so as to induce a hollow cathode discharge, a capillary discharge or the high accumulation of charges from the discharge gap. The inventive apparatus prevents the conversion of the plasma to arcs and thus gives stable, low-temperature plasma in a high density.

Inventors:
Nam, K-Sock
Lee, Saint-Lo
Lee, Ku-Hyun
Ra, John-Ju
Kim, John-Cook
Application Number:
JP2002565398A
Publication Date:
October 10, 2007
Filing Date:
February 08, 2002
Export Citation:
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Assignee:
S. Plasma Incorporated
International Classes:
H05H1/24; B01J19/08; C23C16/503; H01J37/32; H05H1/48
Domestic Patent References:
JP6039555A
JP7296993A
JP10015336A
JP9186135A
JP7118857A
Attorney, Agent or Firm:
Takehiko Suzue
Satoshi Kono
Makoto Nakamura
Kurata Masatoshi
Takashi Mine
Yoshihiro Fukuhara
Sadao Muramatsu
Ryo Hashimoto