To evaluate the quality of a protective film by providing a means for evaluating quality of the protective film to a semiconductor integrated circuit device and using the means in an evaluation method of the semiconductor integrated circuit device, formed in a pellet region 1 and its protective film.

A photodiode part 2, for evaluating quality of the protective film, is formed adjacent to a circuit element forming region of a pellet region 1 and light of an optical projection means 13 is projected via the protective film, formed in an upper part of the photodiode part 2. The current generated of the photodiode part is measured, the light transmittance of the protective film is determined, based on the current value thereof and defective or non-defective of the protective film is decided.

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