Title:
改良ミストおよびミストフローを有するミスト状前駆体の堆積装置および方法
Document Type and Number:
Japanese Patent JP4010343
Kind Code:
B2
Abstract:
A substrate is located within a deposition chamber, the substrate defining a substrate plane. A barrier plate is disposed in spaced relation above the substrate and substantially parallel thereto, the area of said barrier plate in a plane parallel to said substrate being substantially equal to said area of said substrate in said substrate plane, i.e. within 10% of said substrate area. The barrier plate has a smoothness tolerance of 5% of the average distance between said barrier plate and said substrate. A mist is generated, allowed to settle in a buffer chamber, filtered through a 1 micron filter, and flowed into the deposition chamber between the substrate and barrier plate to deposit a liquid layer on the substrate. The liquid is dried to form a thin film of solid material on the substrate, which is then incorporated into an electrical component of an integrated circuit.
Inventors:
Hayashi, Shinichiro
Macmillan, Larry Dee.
Masamichi Azuma
Paz de Arajo, Carlos A.
Macmillan, Larry Dee.
Masamichi Azuma
Paz de Arajo, Carlos A.
Application Number:
JP53190197A
Publication Date:
November 21, 2007
Filing Date:
March 04, 1997
Export Citation:
Assignee:
SYMETRIX CORPORATION
International Classes:
H01L21/31; B05D1/00; B05D3/04; B05D3/06; B05D7/24; C23C8/10; C23C16/448; C23C16/455; C23C16/46; C23C16/48; C23C16/52; C23C18/12; C23C18/14; C23C26/02; C30B7/00; H01L21/02; H01L21/316; H01L27/115; H01L39/24; H01L41/24; C23C16/44; H01L21/314; H05K3/10
Domestic Patent References:
| JP6508659A | ||||
| JP59055368A |
Attorney, Agent or Firm:
Hiroshi Maeda
Hiroshi Takeuchi
Takahisa Shimada
Yuji Takeuchi
Katsumi Imae
Atsushi Fujita
Kazunari Ninomiya
Tomoo Harada
Iseki Katsumori
Seki Kei
Yasuya Sugiura
Hiroshi Takeuchi
Takahisa Shimada
Yuji Takeuchi
Katsumi Imae
Atsushi Fujita
Kazunari Ninomiya
Tomoo Harada
Iseki Katsumori
Seki Kei
Yasuya Sugiura