Title:
半導体デバイスの製造方法並びにプラズマ処理方法
Document Type and Number:
Japanese Patent JP4041212
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To improve the detection sensitivity of fine floating foreign matters in a plasma processing room, and to monitor a contamination situation in the plasma processing room on a real time basis. SOLUTION: Floating foreign matters generated in a processing room are measured by eliminating background noise and emphasizing a foreign matter scattering signal by an irradiating optical system 101 which is irradiated to the inner part of the processing room 1 with a plurality of, beams which have desired wavelengths and which are intensity-modulated by prescribed frequencies, a scattered light detection optical system 102 separating scattered light by a wavelength component, receiving it and converting it into a signal and a plasma floating foreign matter measuring device 103 which separates a plurality of signals showing plasma or the foreign matters floating near it from plasma, and enhancing them by extracting the desired frequency component which is intensity-modulated from the signal.
Inventors:
Hiroyuki Nakano
Toshihiko Nakata
Nobuo Tsumaki
Masayoshi Serizawa
Toshihiko Nakata
Nobuo Tsumaki
Masayoshi Serizawa
Application Number:
JP13729498A
Publication Date:
January 30, 2008
Filing Date:
May 20, 1998
Export Citation:
Assignee:
株式会社日立製作所
International Classes:
G01N15/14; G01N21/85; H01L21/3065; H01L21/205; H01L21/302; H05H1/00; H05H1/46
Domestic Patent References:
| JP5129399A | ||||
| JP10010036A | ||||
| JP8297086A | ||||
| JP9243549A | ||||
| JP8005542A | ||||
| JP11251252A | ||||
| JP9115883A |
Foreign References:
| WO1996028721A1 |
Attorney, Agent or Firm:
Polaire Patent Business Corporation
Katsuo Ogawa
Akio Takahashi
Kyosuke Tanaka
Katsuo Ogawa
Akio Takahashi
Kyosuke Tanaka