To prevent a beam blurring caused by an interval between an MCP (micro channel plate) and a scintillator as well as a space charge effect.
The electron beam equipment is provided with an electron gun 1 having a TaC (titanium alloy casting) cathode, a primary optical system (2, 6, 12, 13) forming primary beams in rectangular beams (3, 4, 5), deflecting them by an E×B separator 11 and irradiating them on a target of a sample 15, a secondary optical system (13, 12, 18, 20) extending and projecting an image of either secondary electrons, back scattering electrons, or reflected electrons on a scintillator plate 21 without an intervention of the MCP, and a TDI (time delayed integration) sensor 24 detecting a secondary electron image projected. Provided that angles α, β, γ are positive real numbers smaller than 90°, and α>β, the primary electron beams are made incident at an angle α against a light axis of the secondary optical system up to the vicinities of the E×B separator 11, deflected by an angle (α-β) by the E×B separator 11, and then radiated toward the target at an angle γ against the normal line of the sample 15 by lenses 12, 13.
COPYRIGHT: (C)2005,JPO&NCIPI
Takao Kato
Toru Satake
Takeshi Murakami
Kenji Watanabe
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Akio Chiba
Osamu Hoshino
Fujihiro Kanda
Hiroyuki Uchida
Toru Miyamae