Title:
低金属ゼオライトを使用してガスから金属不純物を除去する方法
Document Type and Number:
Japanese Patent JP4094853
Kind Code:
B2
Abstract:
A method for removing trace moisture from a gas is disclosed. The method involves heating a zeolite having a high silica-to-alumina ratio to about 400° C. to remove physically adsorbed water from the zeolite, followed by heating the zeolite to a temperature in excess of 650° C., to form a superheated zeolite. The superheated zeolite is contacted with the gas, thereby adsorbing water from the gas. A dehydroxylated zeolite for removing trace moisture from a gas wherein the zeolite has a high silica-to-alumina ratio and a low level of metallic impurities is also disclosed. A method for removing metallic impurities from a gas using the low metals zeolite is also disclosed. The zeolites and methods of the invention are particularly useful for removing trace water and trace metal impurities from acid gases such as hydrogen chloride and hydrogen bromide.
Inventors:
Bader, Paul, M
Tadaharu Watanabe
Frankel, Dan
Tadaharu Watanabe
Frankel, Dan
Application Number:
JP2001574233A
Publication Date:
June 04, 2008
Filing Date:
April 02, 2001
Export Citation:
Assignee:
Matheson Tri-Gas, Inc.
International Classes:
B01D53/28; C01B39/00; B01D53/02; B01D53/04; B01D53/26; B01J20/18; B01J20/30; C01B39/02
Domestic Patent References:
| JP11165023A | ||||
| JP61054235A | ||||
| JP52029471A | ||||
| JP6032601A | ||||
| JP8198618A | ||||
| JP2002526237A |
Attorney, Agent or Firm:
Hideto Asamura
Hajime Asamura
Katsunori Ando
Yukihiro Ikeda
Hajime Asamura
Katsunori Ando
Yukihiro Ikeda