Title:
製膜方法、製膜装置、デバイス、デバイスの製造方法、及び電子機器
Document Type and Number:
Japanese Patent JP4168795
Kind Code:
B2
Abstract:
A plurality of unit areas (bit) B are set on a base board. A liquid drop made of a liquid member is ejected to the unit area B from a liquid drop ejecting head so as to form a layer on the base board. A first pattern is formed by a first nozzle group Na in nozzles N which are formed in the liquid drop ejecting head. A second pattern is formed by a second nozzle group Nb which is different from the first nozzle group Na. By doing this, it is possible to maintain a stable ejection operation so as to form a pattern in preferable accuracy when patterns having different features are formed on the base board by using the liquid drop ejecting apparatus.
Inventors:
Minoru Koyama
Toshimitsu Hirai
Toshimitsu Hirai
Application Number:
JP2003076109A
Publication Date:
October 22, 2008
Filing Date:
March 19, 2003
Export Citation:
Assignee:
Seiko Epson Corporation
International Classes:
B05D1/26; B41J2/01; B05C5/00; B05D5/12; B41J2/21; B41J2/51; B41J3/28; H01J9/02; H01L21/00; H01L21/288; H01L21/3205; H01L21/768; H05K3/12
Domestic Patent References:
| JP11274671A | ||||
| JP11204529A | ||||
| JP2000089019A | ||||
| JP3015208B2 | ||||
| JP55113573A | ||||
| JP2002225259A |
Attorney, Agent or Firm:
Takashi Watanabe
Masatake Shiga
Shinya Mitsuhiro
Masatake Shiga
Shinya Mitsuhiro