Title:
電子線照射装置
Document Type and Number:
Japanese Patent JP4183727
Kind Code:
B2
Abstract:
An electron beam irradiation device having an electron beam generating unit R, an irradiation chamber E for irradiating an electron beam to a irradiated object F, and an oxygen cutoff section S for blowing inert gas N on an upstream side of the irradiated chamber. The oxygen cutoff section is designed so that a gap Ws between partitions across the irradiated object is smaller than a gap We between the partitions across the irradiated object in the irradiation chamber (Ws
Inventors:
Seitaro Nakao
Application Number:
JP2006519404A
Publication Date:
November 19, 2008
Filing Date:
March 09, 2005
Export Citation:
Assignee:
Dai Nippon Printing Co.,Ltd.
International Classes:
G21K5/00; B01J19/12; B05C9/12; B05D3/06; B29C35/08; G21K5/04; G21K5/10
Domestic Patent References:
| JP5060899A | ||||
| JP4127597U | ||||
| JP5009680U |
Attorney, Agent or Firm:
Koji Yamamoto
Akihiko Yamashita
Kishimoto Tatsuto
Akihiko Yamashita
Kishimoto Tatsuto
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