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Title:
リソグラフィー装置及びデバイス製造方法
Document Type and Number:
Japanese Patent JP4277014
Kind Code:
B2
Abstract:
A lithographic apparatus and method, in an embodiment for immersion lithography, are disclosed with a single stage in which leveling and exposure are performed simultaneously.

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Inventors:
Johannes Jacobs Mateus Baselmans
Shoert Nicolas Rambertus Dondels
Christian alexander hogendam
Hans Janssen
Jelone Johannes Sofia Maria Mertens
Bob Strefkerk
Johannes Catherine Hubertus Mulkens
Application Number:
JP2005130901A
Publication Date:
June 10, 2009
Filing Date:
April 28, 2005
Export Citation:
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Assignee:
AS M Netherlands B.V.
International Classes:
H01L21/027; G03B27/42; G03F7/20; G03F9/00
Domestic Patent References:
JP10154659A
JP2003257818A
JP864506A
JP7161614A
JP6283403A
Attorney, Agent or Firm:
Yoshiyuki Inaba
Toshifumi Onuki



 
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