投影露光用マスク、投影露光用マスクの製造方法、投影露光装置および投影露光方法

Title:

投影露光用マスク、投影露光用マスクの製造方法、投影露光装置および投影露光方法

Document Type and Number:

Japanese Patent JP4280509

Kind Code:

B2

Abstract:

A projection exposure mask with a small size and low cost for exposing a member to form a continuous pattern and a discontinuous pattern thereon is disclosed. The projection exposure mask has a first mask pattern for exposing the member to form the continuous pattern thereon and a second mask pattern for exposing the member to form the discontinuous pattern thereon. One of the first and second mask patterns is a reflecting type mask pattern, and the other mask pattern is a transmitting mask pattern.

More Like This:

JPS62297850	LOW REFLECTING PHOTOMASK
WO/2020/160355	EXTREME ULTRAVIOLET MASK ABSORBER MATERIALS
JP7409861	Reflective mask blank, reflective mask, reflective mask manufacturing method, and reflective mask repair method

Inventors:

Nobuyoshi Tanaka
Junji Isobata
Kazuo Iizuka

Application Number:

JP2003025174A

Publication Date:

June 17, 2009

Filing Date:

January 31, 2003

Export Citation:

Click for automatic bibliography generation Help