Title:
シリコーン樹脂及びこれを含有する感光性樹脂組成物
Document Type and Number:
Japanese Patent JP4286374
Kind Code:
B2
Abstract:
This invention relates to photosensitive silicone resins and resin compositions containing the same. Silicone resins of this invention are characterized by that a triorganosilyl group represented by the following general formula (1)wherein R is a divalent organic group and R' is a divalent group or a direct bond is linked to all or a part of the ends of the backbone of polyorganosilsesquioxanes. Photosensitive resin compositions of this invention are formulated from the aforementioned silicone resins and a photogenerator of acid. The aforementioned silicone resins and photosensitive resin compositions show excellent performance as resist materials for multi-level resist processes and for forming barriers of PDP and, on account of their excellent plasma resistance (resistance to O2-RIE), yield patterns of a high aspect ratio.
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Inventors:
Fujiyama Tsuyoshi
Takeo Teramoto
Takeo Teramoto
Application Number:
JP8944199A
Publication Date:
June 24, 2009
Filing Date:
March 30, 1999
Export Citation:
Assignee:
Nippon Steel Chemical Co., Ltd.
International Classes:
C08G77/14; H01L21/027; C08G77/38; C08K5/00; C08L83/06; G03F7/004; G03F7/075
Domestic Patent References:
| JP57105422A | ||||
| JP4106549A | ||||
| JP425530A |
Attorney, Agent or Firm:
Katsuo Naruse
Tomohiro Nakamura
Eiichi Sano
Tomohiro Nakamura
Eiichi Sano