リソグラフィ用データ補正装置及びその装置での処理をコンピュータにて行なわせるためのプログラムを格納した記録媒体

Title:

リソグラフィ用データ補正装置及びその装置での処理をコンピュータにて行なわせるためのプログラムを格納した記録媒体

Document Type and Number:

Japanese Patent JP4302809

Kind Code:

B2

Abstract:

PROBLEM TO BE SOLVED: To provide a data correcting device for lithography performing proximity effect correction according to a layout environment and suppressing an increase in data amount due to the proximity effect correction. SOLUTION: This device is provided with a first correction value decision means S150 dividing a mask pattern based on the data for the lithography at every prescribed part (S120, S130) and deciding a correction value based on deterioration due to exposure of its devided part and correction value adjustment means (S160, S170) adjusting the correction value based on the layout environment in the vicinity of its devided part.

More Like This:

JP4009219	Photomask, pattern formation method using the photomask, and mask data creation method
JP6234998	The method and system for forming a pattern using charged particle beam lithography
JP3259179	INDUSTRIAL APPLICABILITY: Exposure method, semiconductor element forming method, and photomask.

Inventors:

Ryo Tsujimura
Haruki Pearl River
Naorisa Osamu
Hideaki Hasegawa

Application Number:

JP3488199A

Publication Date:

July 29, 2009

Filing Date:

February 12, 1999

Export Citation:

Click for automatic bibliography generation Help

Assignee:

Fujitsu Microelectronics Limited

International Classes:

G03F1/36; G03F1/68; G03F1/70; G06F17/50

Domestic Patent References:

JP9297388A
JP10069058A
JP5267461A
JP10268505A
JP10148928A
JP10083069A
JP8320550A

Attorney, Agent or Firm:

Tadahiko Ito

Previous Patent: 商品検査装置

Next Patent: レーザ発振装置、露光装置及びデバイスの製造方法