Title:
銅イオン含有廃液からの銅の回収方法
Document Type and Number:
Japanese Patent JP4323668
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To recover a good quality copper small in anion content from a waste liquid being industrial waste to be discharged at the time of plating, etching or the like. SOLUTION: In the method for recovering copper as basic copper carbonate by reacting the waste liquid containing cupric chloride, copper sulfate or their mixture to be discharged in the manufacture of a printed circuit board or the like, the copper is recovered from the copper ion-containing waste liquid by previously dispersing basic copper carbonate in water as a seed crystal in a vessel before the reaction, charging the copper ion-containing liquid and a carbonate ion-containing liquid at the same time while stirring, keeping temperature at 65-85 deg.C and pH 8.0-9.0, filtering and separating the basic copper carbonate of the reaction product from the liquid discharged from the reaction vessel, then washing and drying the separated carbonate.
Inventors:
Onomura Isao
Hiroya Togashi
Hiroya Togashi
Application Number:
JP2000069896A
Publication Date:
September 02, 2009
Filing Date:
March 14, 2000
Export Citation:
Assignee:
Nippon Chemical Industry Co., Ltd.
International Classes:
C01G3/00; C22B3/44; C22B7/00; C22B15/00
Domestic Patent References:
| JP49058099A | ||||
| JP49091996A | ||||
| JP50028424A | ||||
| JP56058937A | ||||
| JP2289423A | ||||
| JP8012327A |
Attorney, Agent or Firm:
Hiroyuki Nakagawa