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Title:
レジスト組成物及びそれを用いたパターン形成方法
Document Type and Number:
Japanese Patent JP4328570
Kind Code:
B2
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Inventors:
Takahashi table
Kazuyoshi Mizutani
Koji Shirakawa
Shoichiro Anami
Application Number:
JP2003185174A
Publication Date:
September 09, 2009
Filing Date:
June 27, 2003
Export Citation:
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Assignee:
FUJIFILM Corporation
International Classes:
G03F7/004; G03F7/038; G03F7/039; H01L21/027
Domestic Patent References:
JP10226658A
JP2003195489A
Other References:
Leuschner, R.; Guenther, E.; Falk, G.; Hammerschmidt, A.; Kragler, K.; Rangelow, I. W.; Zimmermann, J.,Bilayer resist process for exposure with low-voltage electrons (STM-lithography),Microelectronic Engineering,1996年 2月19日,(1996), 30(1-4),447-450
Attorney, Agent or Firm:
Takeshi Takamatsu
Kiyozumi Yazawa



 
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